ALEXANDRIA, Va., Feb. 5 -- United States Patent no. 12,216,277, issued on Feb. 4, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).
"Optical element for deconvolution" was invented by Ernest Rehmatulla Post (San Francisco).
According to the abstract* released by the U.S. Patent & Trademark Office: "In one embodiment, a method of constructing a corrective phase mask for an optical element, includes propagating, for each of one or more wavelengths, a point source field from an object plane to a corrective mask plane to determine a source field and propagating, for each of the one or more wavelengths, the point source field from an image plane to the corrective mask plane to determine an image field. The method may furthe...