US Patent Issued to SAMSUNG ELECTRONICS on Feb. 4 for "Method of pre-treating substrate and method of directly forming graphene using the same" (South Korean Inventors)

ALEXANDRIA, Va., Feb. 5 -- United States Patent no. 12,217,958, issued on Feb. 4, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea).

"Method of pre-treating substrate and method of directly forming graphene using the same" was invented by Keunwook Shin (Yongin-si, South Korea), Janghee Lee (Yongin-si, South Korea), Seunggeol Nam (Suwon-si, South Korea), Hyeonjin Shin (Suwon-si, South Korea), Hyunseok Lim (Suwon-si, South Korea), Alum Jung (Suwon-si, South Korea), Kyung-Eun Byun (Seongnam-si, South Korea), Jeonil Lee (Suwon-si, South Korea) and Yeonchoo Cho (Seongnam-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of pre-treating a substrate on which graphene will...