US Patent Issued to SAMSUNG ELECTRONICS on Feb. 3 for "Method for optical proximity correction of photomask layout utilizing parameters obtained through actual photomask manufacture" (South Korean Inventors)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,541,635, issued on Feb. 3, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea).

"Method for optical proximity correction of photomask layout utilizing parameters obtained through actual photomask manufacture" was invented by Sorang Jeon (Seoul, South Korea) and Sunghoon Jang (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A mask layout optical proximity correction (OPC) method includes determining a target pattern to be formed on a substrate, simulating a photomask layout based on the target pattern, applying a bias to the simulated photomask layout, thereby correcting the photomask layout into a first modelin...