US Patent Issued to SAMSUNG ELECTRONICS on Feb. 18 for "Semiconductor device including data storage material pattern" (South Korean Inventors)

ALEXANDRIA, Va., Feb. 19 -- United States Patent no. 12,232,429, issued on Feb. 18, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea).

"Semiconductor device including data storage material pattern" was invented by Jeonghee Park (Hwaseong-si, South Korea), Dongho Ahn (Hwaseong-si, South Korea) and Wonjun Park (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a first conductive line on a lower structure and extending in a first horizontal direction; a second conductive line on the first conductive line and extending in a second horizontal direction, the second horizontal direction being perpendicular to the first horizontal direction;...