ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,548,746, issued on Feb. 10, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Physical vapor deposition apparatus" was invented by Jaesuk Kim (Hwaseong-si, South Korea), Sangwook Park (Seongnam-si, South Korea), Gukrok Yun (Seoul, South Korea) and Kyuhee Han (Seongnam-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A physical vapor deposition (PVD) apparatus includes: a vacuum chamber; a pedestal arranged in the vacuum chamber and configured to support a substrate; a target arranged on the vacuum chamber and including a deposition material; a shield arranged on an inner sidewall of the vacuum chamber to protect the va...