ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,546,005, issued on Feb. 10, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).
"Apparatus for processing a substrate" was invented by Youngjoon Oh (Suwon-si, South Korea), Sangwook Park (Suwon-si, South Korea) and Hyeongpyo Jeon (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus for processing a substrate including a reaction chamber, a stage, a showerhead, a first outer ring and a second outer ring may be provided. The stage may be arranged in the reaction chamber to support the substrate. The showerhead may be arranged in the reaction chamber to provide the substrate with a reaction gas. The first out...