ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,507,794, issued on Dec. 30, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Wafer cleaning apparatus" was invented by Donghoon Kwon (Suwon-si, South Korea) and Jaemin Jung (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A wafer cleaning apparatus includes a wafer roller rotating a wafer around a first direction parallel to a normal direction of a first surface of the wafer, a first brush facing the first surface of the wafer, a second brush facing a second surface of the wafer opposite to the first surface, a first cleaning tank disposed apart from the first brush and movable to accommodate at least a portion...