ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,510,819, issued on Dec. 30, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Optical proximity correction system and operating method" was invented by Hee-Jun Lee (Seoul, South Korea), Sang Wook Kim (Yongin-si, South Korea), Heung Suk Oh (Bucheon-si, South Korea) and Jee Eun Jung (Yongin-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "An optical proximity correction system and an operating method are provided. Provided is an optical proximity correction system comprising, a plurality of patch blocks which include a plurality of patches including a segment information table, a plurality of slave devices which receive ...