US Patent Issued to SAMSUNG ELECTRONICS on Dec. 30 for "EUV generator, EUV lithography apparatus including the same, and method for fabricating semiconductor device using the same" (South Korean Inventors)

ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,513,810, issued on Dec. 30, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"EUV generator, EUV lithography apparatus including the same, and method for fabricating semiconductor device using the same" was invented by Hyeon Jin Kim (Seoul, South Korea), Sung Hyup Kim (Hwaseong-si, South Korea), Jeong-Gil Kim (Hwaseong-si, South Korea), Jeong Du Kim (Seoul, South Korea), Sang Hoon Lee (Seoul, South Korea), In Jae Lee (Hwaseong-si, South Korea) and Jong Gu Lee (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An extreme ultraviolet light generator includes a collector including a first focus and a second focus, a dro...