ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,504,696, issued on Dec. 23, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Method for monitoring process variation index" was invented by Dahan Kang (Seongnam-si, South Korea) and Youngseok Kim (Osan-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for monitoring a process variation index includes operations of: obtaining a target parameter to be monitored and a reference parameter used to increase goodness of fit among structural parameters predicted by measuring a structure in a specific location of a wafer; obtaining a reference parameter set in a reference model; and calculating a process variation inde...