ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,379,328, issued on Aug. 5, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Inspection system and inspection method for semiconductor device" was invented by Wookjin Lee (Suwon-si, South Korea) and Ghilgeun Oh (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "An optical failure detection system includes a test chamber having an accommodating space therein, the test chamber including an upper cover having an opening therein; a substrate plate provided in the opening of the upper cover, the substrate plate including: a first surface on which a wafer is disposed; a second surface opposite to the first surface; and a...