US Patent Issued to SAMSUNG ELECTRONICS on Aug. 26 for "Substrate process apparatus and substrate process method using the same" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,400,836, issued on Aug. 26, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Substrate process apparatus and substrate process method using the same" was invented by Jaehyun Park (Suwon-si, South Korea) and Jingoo Lee (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate process apparatus includes a chamber body providing a process space and a chamber lid coupled to the chamber body, the chamber lid includes a focus adapter providing a diffusion space of which width increases in a direction approaching a bottom of the focus adapter, a lid body surrounding the focus adapter, and a coupling adapter support...