US Patent Issued to SAMSUNG ELECTRONICS on Aug. 26 for "Gas treatment system and gas treatment method using the same" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,400,879, issued on Aug. 26, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Gas treatment system and gas treatment method using the same" was invented by Wonsu Lee (Seoul, South Korea), Kimoon Lee (Seoul, South Korea), Seungjun Lee (Hwaseong-si, South Korea), Jong san Chang (Suwon-si, South Korea) and Joungwoo Han (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A gas treatment system includes a first scrubber, a regenerative catalytic oxidizer (RCO) that treats gas that passes through the first scrubber, a second scrubber that treats the gas that passed through the regenerative catalytic oxidizer, and a diele...