US Patent Issued to SAMSUNG ELECTRONICS on Aug. 19 for "Apparatus trapping an exhaust material from a substrate-processing process and apparatus for processing a substrate including the trapping apparatus" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,390,763, issued on Aug. 19, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Apparatus trapping an exhaust material from a substrate-processing process and apparatus for processing a substrate including the trapping apparatus" was invented by Uihyoung Lee (Hwaseong-si, South Korea), Suji Gim (Hwaseong-si, South Korea), Hongsik Park (Suwon-si, South Korea) and Taeheon Lee (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus for trapping an exhaust material from a substrate-processing process includes: a cyclone configured to provide the exhaust material with a swirling flow, wherein the exhaust mater...