US Patent Issued to SAMSUNG ELECTRONICS on April 8 for "Spectroscopic analysis method, method for fabricating semiconductor device using the same, and substrate process system using the same" (South Korean Inventors)

ALEXANDRIA, Va., April 9 -- United States Patent no. 12,272,535, issued on April 8, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Spectroscopic analysis method, method for fabricating semiconductor device using the same, and substrate process system using the same" was invented by Se Jin Oh (Hwaseong-si, South Korea), Doo Young Gwak (Suwon-si, South Korea), Tae Hyun Kim (Suwon-si, South Korea), Sang Ki Nam (Seongnam-si, South Korea), Jae Ho Jang (Seoul, South Korea) and Jin Kyou Choi (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A spectroscopic analysis method having improved accuracy and correlation, a method for fabricating a semiconductor device using th...