ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,543,337, issued on Feb. 3, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea) and Soulbrain Co. Ltd. (Seongnam-Si, South Korea).

"Oxide film coating solution and semiconductor device manufacturing method using the same" was invented by Chang Ju Yeom (Seoul, South Korea), Chang Su Jeon (Hwaseong-si, South Korea), Jung Min Oh (Incheon, South Korea), Sang Won Bae (Suwon-si, South Korea), Jae Sung Lee (Suwon-si, South Korea), Hyo San Lee (Hwaseong-si, South Korea) and Jung Hun Lim (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for manufacturing a semiconductor device, the method including forming a fin type pa...