ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,439,738, issued on Oct. 7, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea) and SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION (Seoul, South Korea).
"Semiconductor structure and method of manufacturing the same" was invented by Kyungwook Hwang (Seoul, South Korea), Ho Won Jang (Seoul, South Korea), Junsik Hwang (Hwaseong-si, South Korea), Jehong Oh (Seoul, South Korea), Jungel Ryu (Seoul, South Korea) and Seungmin Lee (Seoul, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a semiconductor structure and a method of manufacturing the same. The semiconductor structure includes a substrate, a membrane bridge that define...