ALEXANDRIA, Va., June 12 -- United States Patent no. 12,297,532, issued on May 13, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea) and Research & Business Foundation Sungyunkwan University (Gyeonggi-do, South Korea).
"Metal chalcogenide film and method and device for manufacturing the same" was invented by Kyung-Eun Byun (Seongnam-si, South Korea), Hyoungsub Kim (Seoul, South Korea), Taejin Park (Yongin-si, South Korea), Hyeonjin Shin (Suwon-si, South Korea), Hoijoon Kim (Daejeon, South Korea), Wonsik Ahn (Bucheon-si, South Korea) and Mirine Leem (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a metal chalcogenide thin film and a method and device fo...