ALEXANDRIA, Va., July 3 -- United States Patent no. 12,346,022, issued on July 1, was assigned to SAMSUNG ELECTRONICS Co. LTD. (South Korea) and Research & Business Foundation SUNGKYUNKWAN UNIVERSITY (South Korea).

"Method of fabricating pellicle structure" was invented by Mun Ja Kim (Hwaseong-si, South Korea), Ji Beom Yoo (Seoul, South Korea), Ki Bong Nam (Suwon-si, South Korea), Jin Ho Yeo (Suwon-si, South Korea), Changyoung Jeong (Yongin-si, South Korea) and Qicheng Hu (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of fabricating a pellicle structure includes forming a metal layer on a temporary substrate, forming a membrane on the metal layer, exposing a bottom surface of ...