ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,550,672, issued on Feb. 10, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea) and MiCo Ceramics Ltd. (Anseong-si, South Korea).
"Susceptor and manufacturing method therefor" was invented by Myungsub Jung (Suwon-si, South Korea), Jun Won Seo (Anseong-si, South Korea), Sungyeol Kim (Suwon-si, South Korea), Sungyong Lim (Suwon-si, South Korea), Hadong Jin (Suwon-si, South Korea) and Jaehyun Choi (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a susceptor for enabling uniform plasma treatment over the entire surface of a wafer, and a manufacturing method therefor. Provided is the susceptor comprising: a...