US Patent Issued to SAMSUNG ELECTRONICS, KPX CHEMICAL on July 15 for "Compositions for removing photoresists and methods of manufacturing semiconductor devices and semiconductor packages using the compositions" (South Korean Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,360,457, issued on July 15, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea) and KPX CHEMICAL Co. LTD (Seoul, South Korea).

"Compositions for removing photoresists and methods of manufacturing semiconductor devices and semiconductor packages using the compositions" was invented by Hyojin Yun (Suwon-si, South Korea), Seungwon Kim (Hwaseong-si, South Korea), Taeyoung Kim (Yongin-si, South Korea), Woojung Park (Hwaseong-si, South Korea), Jinhye Bae (Suwon-si, South Korea), Hyunseop Shin (Yongin-si, South Korea), Mintae Lee (Yongin-si, South Korea), Hoon Han (Suwon-si, South Korea), Moonyoung Kim (Seoul, South Korea), Moonchang Kim (Yongin-si, South Korea), Cheolmo Yan...