US Patent Issued to SAMSUNG ELECTRONICS, INHA Industry Partnership Institute on Dec. 23 for "Acetal-based compound, acetal-based prepolymer, acetal-based polymer, and photoresist composition comprising the same" (South Korean Inventors)

ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,503,433, issued on Dec. 23, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea) and INHA Industry Partnership Institute (Incheon, South Korea).

"Acetal-based compound, acetal-based prepolymer, acetal-based polymer, and photoresist composition comprising the same" was invented by Chanjae Ahn (Suwon-si, South Korea), Myungwoong Kim (Incheon, South Korea), Yoonhyun Kwak (Suwon-si, South Korea) and Sol An (Incheon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An acetal-based compound represented by Formula 1, an acetal-based prepolymer, an acetal-based polymer, and a photoresist composition including the same wherein in Formul...