US Patent Issued to SAMSUNG ELECTRONICS, DONGWOO FINE-CHEM on May 13 for "Etching compositions and methods for fabricating semiconductor devices by using the same" (South Korean Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,297,385, issued on May 13, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea) and DONGWOO FINE-CHEM Co. LTD. (Iksan-si, South Korea).

"Etching compositions and methods for fabricating semiconductor devices by using the same" was invented by Min Hyung Cho (Suwon-si, South Korea), Hyo Joong Yoon (Iksan-si, South Korea), Min Ju Im (Iksan-si, South Korea), Jung Min Oh (Incheon, South Korea), Sang Won Bae (Suwon-si, South Korea) and Hyo San Lee (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Etching compositions are provided. The etching compositions can be used for etching cobalt. The etching compositions may inclu...