ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,512,264, issued on Dec. 30, was assigned to SAMSUNG ELECTRO-MECHANICS Co. LTD. (Suwon-si, South Korea).

"Dielectric composition and multilayer capacitor" was invented by Jae Sung Park (Suwon-si, South Korea), Hyoung Uk Kim (Suwon-si, South Korea), Je Hee Lee (Suwon-si, South Korea), Hyung Joon Jeon (Suwon-si, South Korea) and Jong Ho Lee (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A dielectric composition and a multilayer capacitor including the same are disclosed. The dielectric composition including: a BaTiO3-based main ingredient; a first auxiliary ingredient including rare earth elements; and a second auxiliary ingredient i...