ALEXANDRIA, Va., June 16 -- United States Patent no. 12,303,947, issued on May 20, was assigned to SAMSUNG DISPLAY Co. LTD. (Yongin-si, South Korea).
"Apparatus for cleaning mask" was invented by Jai Phoong Kim (Yongin-si, South Korea), Jae Hoon Lee (Yongin-si, South Korea), Hyuk Kang (Yongin-si, South Korea), Chang Uk An (Yongin-si, South Korea), Han Geul Lim (Yongin-si, South Korea) and Byung Jin Choi (Yongin-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A mask cleaning apparatus includes a cleaning bath including an accommodating space in which a cleaning solution is stored, a transfer robot transferring a mask, and an induction heating member disposed inside the accommodating space. The ...