ALEXANDRIA, Va., June 25 -- United States Patent no. 12,341,145, issued on June 24, was assigned to Samsung Display Co. Ltd. (Yongin-si, South Korea).
"Method for forming conductive pattern and display device including conductive pattern" was invented by Jun Woo You (Seongnam-si, South Korea), Byoung Dae Ye (Yongin-si, South Korea), Tae Ho Lee (Hwaseong-si, South Korea) and Atsushi Nemoto (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A conductive pattern forming method according to an embodiment includes: forming a first conductive pattern on a substrate; sequentially forming a release layer and a conductive layer on a transfer substrate that includes a mask; irradiating intense pulse...