ALEXANDRIA, Va., June 19 -- United States Patent no. 12,333,706, issued on June 17, was assigned to Samsung Display Co. Ltd. (Yongin-si, South Korea).
"Mask inspection apparatus and method for inspecting a mask having first and second openings" was invented by Dae Won Baek (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A mask inspection method and a mask inspection apparatus for inspecting a deposition mask are provided. A mask inspection method includes: providing a deposition mask including a plurality of first openings and a plurality of second openings, each of the first openings having a shape in a plan view different from that of each of the second openings; designating a first...