ALEXANDRIA, Va., July 23 -- United States Patent no. 12,365,975, issued on July 22, was assigned to SAMSUNG DISPLAY Co. LTD. (Yongin-si, South Korea).
"Sputtering apparatus and CVD mask coating method using the same" was invented by Sungmin Hur (Yongin-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A sputtering apparatus includes a rotary target extending in a first direction, a gas supply bar disposed on the rotary target, and a substrate holder positioned opposite the gas supply bar with respect to the rotary target. The gas supply bar includes a first flow path extending in the first direction, and a second flow path spaced apart from the first flow path in the first direction and separate...