US Patent Issued to SAMSUNG DISPLAY on Feb. 4 for "Etching device and etching method using the same" (South Korean Inventors)

ALEXANDRIA, Va., Feb. 5 -- United States Patent no. 12,217,978, issued on Feb. 4, was assigned to SAMSUNG DISPLAY Co. LTD. (Gyeonggi-Do, South Korea).

"Etching device and etching method using the same" was invented by Wonje Cho (Osan-si, South Korea) and Duckjung Lee (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An etching device includes a nozzle unit including at least one nozzle including an etching solution injection hole, an etching solution collection hole, and a sealing part. The etching solution injection hole is configured to provide an etching solution to an etching object, the etching solution collection hole is configured to collect the etching solution, and the sealing...