ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,399,424, issued on Aug. 26, was assigned to Samsung Display Co. Ltd. (Yongin-si, South Korea).
"Photomask assembly" was invented by Hyung-Gyu Park (Yongin-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A photomask assembly includes: a transparent substrate; a first insulating layer on the transparent substrate and having hydrophilicity; a first metal layer on the first insulating layer and having a first opening; a second insulating layer on the first metal layer and having hydrophobicity; and a lens unit in the first opening."
The patent was filed on July 21, 2021, under Application No. 17/382,220.
*For further information, including ...