ALEXANDRIA, Va., April 9 -- United States Patent no. 12,269,140, issued on April 8, was assigned to SAMSUNG DISPLAY Co. LTD. (Gyeonggi-Do, South Korea).
"Substrate polishing apparatus" was invented by Seungbae Kang (Suwon-si, South Korea), Joon-hwa Bae (Suwon-si, South Korea), Heesung Yang (Seoul, South Korea), Woojin Cho (Yongin-si, South Korea) and Byoungkwon Choo (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate polishing apparatus including a stage configured to load a substrate, the stage having a flat surface, which is parallel to a first direction and a second direction, and on which the substrate is loaded, a pressing unit configured to exert a pressure on the subst...