US Patent Issued to SAMSUNG DISPLAY, HIMS on Nov. 4 for "Photomask inspection apparatus and method of inspecting photomask using the same" (South Korean Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,460,991, issued on Nov. 4, was assigned to SAMSUNG DISPLAY Co. LTD. (Gyeonggi-do, South Korea) and HIMS Co. LTD. (Incheon, South Korea).

"Photomask inspection apparatus and method of inspecting photomask using the same" was invented by Chanhyeong Cho (Yongin-si, South Korea), Tae Joon Kim (Yongin-si, South Korea), Jeongmin Park (Yongin-si, South Korea), Hyeonguk Yeo (Yongin-si, South Korea), Juil Kim (Incheon, South Korea) and Daehoon Min (Incheon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photomask inspection apparatus includes a stage which supports an inspection substrate, a first optical system having a first numerical aperture and...