ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,449,380, issued on Oct. 21, was assigned to Samsung Display Co. Ltd. (Yongin-Si, South Korea) and Dongguk University Industry-Academic Cooperation Foundation (Seoul, South Korea).
"Defect analysis device and defect analysis method using the same" was invented by Yeon Keon Moon (Yongin-si, South Korea), Jun Hyung Lim (Yongin-si, South Korea), Kwun-Bum Chung (Seoul, South Korea), Kwang Sik Jeong (Seoul, South Korea) and Hyun Min Hong (Seoul, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a defect analysis device which may include a light source that irradiates an analysis target layer of an element with light, a position adjuster t...