US Patent Issued to RUBYCON on Oct. 28 for "Thin film polymer laminated capacitor and manufacturing method therefor" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,456,584, issued on Oct. 28, was assigned to RUBYCON Corp. (Ina, Japan).

"Thin film polymer laminated capacitor and manufacturing method therefor" was invented by Toshihito Kanai (Ina, Japan), Arina Hayakawa (Ina, Japan) and Tomonao Kako (Ina, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention pertains to a thin-film polymer laminated capacitor having a structure in which a resin thin film layer and an internal electrode metal layer are alternately laminated. The resin thin film layer has a high molecular weight structure obtained through polymerization of a first monomer which is a polyfunctional monomer and a second monomer whic...