US Patent Issued to RTX on Feb. 10 for "In-situ solid chemical vapor deposition precursor delivery" (Connecticut Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,545,997, issued on Feb. 10, was assigned to RTX Corp. (Farmington, Conn.).

"In-situ solid chemical vapor deposition precursor delivery" was invented by Jun Nable (Hamden, Conn.), Ying She (Rocky Hill, Conn.) and Olivier H. Sudre (Glastonbury, Conn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A chemical vapor deposition system comprises a reactor including at least one wall extending between an inlet end and an outlet end, and an internal volume defined by the at least one wall, the inlet end, and the outlet end. The reactor further comprises a heat source in thermal communication with the internal volume, and a solid precursor container removably pla...