ALEXANDRIA, Va., June 6 -- United States Patent no. 12,283,494, issued on April 22, was assigned to RORZE SYSTEMS Corp. (Yongin-si, South Korea).
"Substrate transferring apparatus" was invented by Seung Bae Oh (Yongin-si, South Korea), Masahiko Uchiyama (Yongin-si, South Korea), Suk Jun Lee (Yongin-si, South Korea) and Kwan Young Cho (Yongin-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate transferring apparatus capable of reducing a nitrogen gas for purging and a shutdown time thereof. The Substrate transferring apparatus includes a ventilation driving room, a FOUP receiving room, a driving equipment room and a ventilation duct. The ventilation driving room is equipped with a main ...