ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,438,035, issued on Oct. 7, was assigned to ROHM Co. LTD. (Kyoto, Japan).
"Semiconductor device and method for manufacturing the same" was invented by Mitsuhide Kori (Kyoto, Japan) and Yuji Matsumoto (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The semiconductor device includes an Si chip which has a main surface facing a {100} plane, a trench which is formed by digging down the main surface and has an open end extending inclined in a greater than110less than direction side with respect to a greater than100less than direction in a plan view, and an oxide film which is constituted of an oxide of the Si chip and formed as a film on the main ...