ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,411,409, issued on Sept. 9, was assigned to Rohm and Haas Electronic Materials LLC (Marlborough, Mass.).

"Aromatic underlayer" was invented by Sheng Liu (Bow, N.H.), James F. Cameron (Brookline, Mass.), Shintaro Yamada (Shrewsbury, Mass.), Iou-Sheng Ke (Andover, Mass.), Keren Zhang (Kirkland, Wash.), Daniel Greene (Louisville, Ky.), Paul J. LaBeaume (Auburn, Mass.), Li Cui (Westborough, Mass.) and Suzanne M. Coley (Mansfield, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Compounds having three or more alkynyl moieties substituted with an aromatic moiety having one or more of certain substituents are useful in forming underlayers useful in semico...