US Patent Issued to ROHM AND HAAS ELECTRONIC MATERIALS KOREA on March 4 for "Coating compositions for use with an overcoated photoresist" (South Korean Inventors)

ALEXANDRIA, Va., March 5 -- United States Patent no. 12,242,193, issued on March 4, was assigned to ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (Ghungcheongnam-Do, South Korea).

"Coating compositions for use with an overcoated photoresist" was invented by Eui-Hyun Ryu (Cheonan, South Korea), Jin Hong Park (Hwaseong, South Korea), You Rim Shin (Hwaseong, South Korea), Ji-Hon Kang (Hwaseong, South Korea), Jung-June Lee (Cheonan, South Korea) and Jae-Bong Lim (Cheonan, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that in a first aspect comprise a crosslinker compone...