ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,442,993, issued on Oct. 14, was assigned to Rockley Photonics Ltd. (Altrincham, Great Britain).
"System and method for measuring alignment" was invented by Chia-Te Chou (Brea, Calif.), Albert Benzoni (South Pasadena, Calif.), Michael Lee (Los Angeles), Cristian Stagarescu (Los Angeles), William Vis (Pasadena, Calif.) and Melissa Ziebell (Pasadena, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A system and method for alignment. In some embodiments, the method includes measuring a first offset, the first offset being an offset along a first direction between a first alignment mark and a second alignment mark, the first alignment mark being an alig...