ALEXANDRIA, Va., June 17 -- United States Patent no. 12,313,573, issued on May 27, was assigned to RIGAKU Corp. (Tokyo).
"X-ray diffraction apparatus and measurement method" was invented by Hisashi Konaka (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "According to an aspect of the present invention, an X-ray diffraction apparatus is provided. The X-ray diffraction apparatus comprises: an X-ray source configured to irradiate a sample with an X-ray; a sample stage configured to allow the sample to be disposed in such a manner that the X-ray is diffracted; a detector configured to detect a diffracted X-ray, which is the X-ray that has been diffracted, in one dimension at a detection strip; a slit member ...