US Patent Issued to RIGAKU on April 29 for "Device and method for analyzing diffraction pattern of mixture, and information storage medium" (Japanese Inventor)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,287,300, issued on April 29, was assigned to RIGAKU Corp. (Tokyo).

"Device and method for analyzing diffraction pattern of mixture, and information storage medium" was invented by Hideo Toraya (Akishima, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A device for analyzing a diffraction pattern of a mixture uses a fitting pattern including a term related to a known target pattern, which indicates a target component and which is changeable in shape with use of a shape parameter, and a term related to an unknown pattern, which indicates a residual group. The fitting pattern is fitted to an observed pattern with a given value assigned to the shape par...