US Patent Issued to RICOH on Nov. 4 for "Management apparatus, production system, and management method of extracting a combination of two or more structures" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,459,210, issued on Nov. 4, was assigned to RICOH COMPANY LTD. (Tokyo).

"Management apparatus, production system, and management method of extracting a combination of two or more structures" was invented by Katsuhiko Omodaka (Kanagawa, Japan) and Hidenori Shindoh (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A management apparatus includes circuitry to manage multiple structures including a fabrication object fabricated by a fabrication apparatus in a fabrication area of the fabrication apparatus and extract a combination of two or more structures from the multiple structures based on shape information of the multiple structures."

The patent was ...