US Patent Issued to RICOH on July 22 for "Liquid application apparatus, liquid application method, and storage medium" (Japanese Inventors)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,365,187, issued on July 22, was assigned to RICOH COMPANY LTD. (Tokyo).

"Liquid application apparatus, liquid application method, and storage medium" was invented by Nao Uemoto (Kanagawa, Japan) and Yuki Tsuchiya (Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A liquid application apparatus includes a liquid discharge head and processing circuitry. The liquid discharge head discharges liquid. The processing circuitry causes the liquid application apparatus to sequentially move to each of a plurality of divided areas obtained by dividing a liquid application area in which the liquid discharge head performs liquid application. The processi...