US Patent Issued to Resonac on June 17 for "Method for producing purified chloroprene-based-polymer latex" (Japanese Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,331,137, issued on June 17, was assigned to Resonac Corp. (Tokyo).

"Method for producing purified chloroprene-based-polymer latex" was invented by Yuki Miura (Yokohama, Japan) and Keiichi Nakamura (Kawasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a method for producing purified chloroprene-based-polymer latex which enables efficiently removing a residual volatile organic substance from chloroprene-based-polymer latex while suppressing foaming and the deposition of aggregates. The method for producing purified chloroprene-based-polymer latex of the present invention has at least the following steps (I) to (III): Step (I): a step...