ALEXANDRIA, Va., July 16 -- United States Patent no. 12,358,796, issued on July 15, was assigned to Resonac Corp. (Tokyo).
"Method for producing fluorine gas" was invented by Koki Fujimura (Tokyo), Hiroshi Kobayashi (Tokyo) and Yohsuke Fukuchi (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for producing fluorine gas including a fluorination step of obtaining a reaction mixture containing a major fluorinated substance that is a target component generated by fluorination of a raw material compound and by-product hydrogen fluoride, a separation step of separating the reaction mixture to obtain a main product component containing the major fluorinated substance and a by-product component containi...