US Patent Issued to Resonac on July 15 for "Anode for electrolytic synthesis and method for producing fluorine gas or fluorine containing compound" (Japanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,359,328, issued on July 15, was assigned to Resonac Corp. (Tokyo).

"Anode for electrolytic synthesis and method for producing fluorine gas or fluorine containing compound" was invented by Yohsuke Fukuchi (Tokyo), Katsumi Mikami (Tokyo) and Hiroshi Kobayashi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided an anode for electrolytic synthesis capable of electrolytically synthesizing fluorine gas or a fluorine containing compound by a simple process and at a low cost while suppressing the occurrence of an anode effect. An anode for electrolytic synthesis (3) for electrolytically synthesizing fluorine gas or a fluorine containing comp...