US Patent Issued to RESONAC on Feb. 24 for "Photosensitive element and method for producing photosensitive element" (Japanese Inventors)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,560,867, issued on Feb. 24, was assigned to RESONAC Corp. (Tokyo).

"Photosensitive element and method for producing photosensitive element" was invented by Yosuke Kaguchi (Tokyo), Akiko Takeda (Tokyo) and Masakazu Kume (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photosensitive element according to the present disclosure can be produced by a method including a step of forming a photosensitive layer on a support film using a photosensitive resin composition and a step of bonding a winding outer surface of a protective film having a roll shape onto the photosensitive layer, and includes a support film, a photosensitive layer provided on one sur...