ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,545,862, issued on Feb. 10, was assigned to Resonac Corp. (Tokyo).
"Method for producing decomposing/cleaning composition" was invented by Susumu Nakazaki (Tokyo) and Kuniaki Miyahara (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a method for producing a decomposing/cleaning composition which improves etching speed retention. In particular, a method for producing a decomposing/cleaning composition which contains (A) an N-substituted amide compound in which a hydrogen atom is not directly bonded to a nitrogen atom and (B) a quaternary alkyl ammonium fluoride or a hydrate thereof is provided, the method having a preparation step for mi...