ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,508,386, issued on Dec. 30, was assigned to ResMed Pty Ltd (Bella Vista, Australia).
"Mask system" was invented by Matthew Eves (Sydney), Muditha Pradeep Dantanarayana (Sydney), Errol Savio Alex D'Souza (Sydney), Rupert Christian Scheiner (Sydney), Stuart Norris Plascott (Sydney), Jamie Graeme Wehbeh (Sydney) and Murray William Lee (Sydney).
According to the abstract* released by the U.S. Patent & Trademark Office: "A mask system includes a frame defining a breathing chamber, a cushion provided to the frame and adapted to form a seal with the patient's face, and a shroud provided to the frame and adapted to attach headgear. The shroud includes a retaining mechanism structured to conn...